–New Technique for Next-Generation 45nm CMOS Technology Boosts Gate Density to 2.6 Times Higher Than That of 65nm CMOS Technology–
VLSI Technology 2008
Toshiba Corporation (TOKYO:6502) today announced that it has developed a new compact model for circuit design that achieves higher gate density and improved cost-performance in next-generation 45nm CMOS technology. By applying this technique, [...]

Ken Goldman and James H. Hodge Bring Broad Experience and Solid Track Record of Success to Ingres
Slough, United Kingdom, 25th February 2008 — Ingres Corporation, a leading open source information management company for enterprise applications, today announced that it has appointed two prestigious new board members. Ken Goldman and James H. Hodge bring a wealth [...]