–New Technique for Next-Generation 45nm CMOS Technology Boosts Gate Density to 2.6 Times Higher Than That of 65nm CMOS Technology–
VLSI Technology 2008
Toshiba Corporation (TOKYO:6502) today announced that it has developed a new compact model for circuit design that achieves higher gate density and improved cost-performance in next-generation 45nm CMOS technology. By applying this technique, [...]